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A Si stencil mask for deep X-ray lithography fabricated by MEMS technology

✍ Scribed by Harutaka Mekaru; Takayuki Takano; Yoshiaki Ukita; Yuichi Utsumi; Masaharu Takahashi


Publisher
Springer-Verlag
Year
2008
Tongue
English
Weight
747 KB
Volume
14
Category
Article
ISSN
0946-7076

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