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Manganese behaviour in ZnO layers deposited by magnetron sputtering for spintronic application

✍ Scribed by Abouzaid, M. ;Ruterana, P. ;Liu, C. ;Morkoç, H.

Publisher
John Wiley and Sons
Year
2008
Tongue
English
Weight
172 KB
Volume
205
Category
Article
ISSN
0031-8965

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✦ Synopsis

Abstract

In this work, we carry out structural analysis of ferromagnetic Mn‐doped ZnO thin films deposited by radio frequency magnetron sputtering, using transmission electron microscopy (TEM). On top of sapphire (0001) substrates, Mn rich precipitates and an interface reaction layer are observed follow‐ ing the deposition of Zn(Mn)O layers above 500 °C. The crystalline quality of ZnO layers deposited by magnetron sputtering is highly improved at 500 °C as well as the measured ferromagnetic response. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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