✦ LIBER ✦

Optimization of aluminum-doped ZnO thin-film deposition by magnetron sputtering for liquid crystal display applications

✍ Scribed by Minami, Tadatsugu ;Miyata, Toshihiro ;Ohtani, Yuusuke

Publisher: John Wiley and Sons
Year: 2007
Tongue: English
Weight: 236 KB
Volume: 204
Category: Article
ISSN: 0031-8965
DOI: 10.1002/pssa.200622533

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✦ Synopsis

Abstract

This paper describes the optimization of ZnO:Al (AZO) thin films formed by a magnetron sputtering method for the purpose of creating a substitute for the indium‐tin‐oxide (ITO) transparent electrodes used in liquid crystal display (LCD) applications. New AZO thin‐film preparation techniques for both decreasing resistivity as well as improving resistivity distribution have been investigated: magnetron sputtering deposition in a weakly reducing atmosphere and newly developed high‐rate magnetron sputtering deposition techniques. A low resistivity below 5 × 10^–4^ Ω cm and improvement of the resistivity distribution could be obtained using a commercially available high density sintered AZO target by introducing hydrogen gas into the deposition chamber during depositions with a dc magnetron sputtering method that incorporates rf power. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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