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Magnetron sputtering of hard Cr–Al–N–O thin films

✍ Scribed by M. Stüber; U. Albers; H. Leiste; K. Seemann; C. Ziebert; S. Ulrich

Book ID
108278424
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
773 KB
Volume
203
Category
Article
ISSN
0257-8972

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✍ M. Sridharan; M. Sillassen; J. Bøttiger; J. Chevallier; H. Birkedal 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 673 KB

Al 2 O 3 films were deposited by reactive ionized magnetron sputtering and their hardness was measured by nanoindentation. The magnetron was powered with a pulsed DC power supply, and the substrate was negatively biased with a pulsed DC voltage supply. An RF powered coil was located above the substr