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Magnetoresistance in Co-Cu Alloy Films Formed by Electrodeposition Method

✍ Scribed by Ueda, Yuji; Ito, Masaki

Book ID
126286460
Publisher
Institute of Pure and Applied Physics
Year
1994
Tongue
English
Weight
462 KB
Volume
33
Category
Article
ISSN
0021-4922

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πŸ“œ SIMILAR VOLUMES

Magnetoresistance Effect of Co–Cu Nanost
Magnetoresistance Effect of Co–Cu Nanostructure Prepared by Electrodeposition Method
✍ Y. Ueda; T. Houga; H. Zaman; A. Yamada πŸ“‚ Article πŸ“… 1999 πŸ› Elsevier Science 🌐 English βš– 209 KB

It was possible to produce Co+Cu multilayer and alloy 5lms controlled in the atomic scale by electrodeposition. We have examined the magnetoresistance (MR) in the Co+Cu multilayers and the alloy 5lms produced by electrodeposition and have investigated the relationships between the magnetoresistance