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Magnetoresistance effect of Co/Cu multilayer film produced by electrodeposition method

✍ Scribed by Y. Ueda; N. Hataya; H. Zaman

Book ID
113321413
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
160 KB
Volume
156
Category
Article
ISSN
0304-8853

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πŸ“œ SIMILAR VOLUMES

Magnetoresistance Effect of Co–Cu Nanost
Magnetoresistance Effect of Co–Cu Nanostructure Prepared by Electrodeposition Method
✍ Y. Ueda; T. Houga; H. Zaman; A. Yamada πŸ“‚ Article πŸ“… 1999 πŸ› Elsevier Science 🌐 English βš– 209 KB

It was possible to produce Co+Cu multilayer and alloy 5lms controlled in the atomic scale by electrodeposition. We have examined the magnetoresistance (MR) in the Co+Cu multilayers and the alloy 5lms produced by electrodeposition and have investigated the relationships between the magnetoresistance