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Magnetoresistance Effect of Co–Cu Nanostructure Prepared by Electrodeposition Method

✍ Scribed by Y. Ueda; T. Houga; H. Zaman; A. Yamada

Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
209 KB
Volume
147
Category
Article
ISSN
0022-4596

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✦ Synopsis

It was possible to produce Co+Cu multilayer and alloy 5lms controlled in the atomic scale by electrodeposition. We have examined the magnetoresistance (MR) in the Co+Cu multilayers and the alloy 5lms produced by electrodeposition and have investigated the relationships between the magnetoresistance and 5lm thickness, composition, and magnetization. For the Co+Cu multilayer 5lms the maximum MR ratio at 300 K is about 16% (21 kOe) and at 5 K it increases to about 24%. The MR ratio is more strongly dependent on the Co alloy ferromagnetic layer thickness than the change of the composition near the interface between Co alloy and Cu layers. The giant magnetoresistance has also been observed for Co+Cu alloy 5lms. The maximum MR ratio of the Co+Cu alloy 5lms increases to 6.3% after annealing the 5lm at 723 K for 1 hour.

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