Low-temperature silicon selective deposition and epitaxy on silicon using the thermal decomposition of silane under ultraclean environment

✍ Scribed by Murota, Junichi; Nakamura, Naoto; Kato, Manabu; Mikoshiba, Nobuo; Ohmi, Tadahiro

• Book ID: 120065969
• Publisher: American Institute of Physics
• Year: 1989
• Tongue: English
• Weight: 557 KB
• Volume: 54
• Category: Article
• ISSN: 0003-6951
• DOI: 10.1063/1.100781