Interlayer Mediated Epitaxy of Cobalt Silicide on Silicon (100) from Low Temperature Chemical Vapor Deposition of Cobalt Formation Mechanisms and Associated Properties

✍ Scribed by Londergan, Ana R.; Nuesca, Guillermo; Goldberg, Cindy; Peterson, Gregory; Kaloyeros, Alain E.; Arkles, Barry; Sullivan, John J.

• Book ID: 121384472
• Publisher: The Electrochemical Society
• Year: 2001
• Tongue: English
• Weight: 790 KB
• Volume: 148
• Category: Article
• ISSN: 0013-4651
• DOI: 10.1149/1.1344535