ChemInform Abstract: Interlayer Mediated Epitaxy of Cobalt Silicide on Silicon (100) from Low Temperature Chemical Vapor Deposition of Cobalt.

✍ Scribed by Ana R. Londergan; Guillermo Nuesca; Cindy Goldberg; Gregory Peterson; Alain E. Kaloyeros; Barry Arkles; John J. Sullivan

• Publisher: John Wiley and Sons
• Year: 2001
• Weight: 32 KB
• Volume: 32
• Category: Article
• ISSN: 0931-7597
• DOI: 10.1002/chin.200120233