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Low temperature oxidation of CVD SiC by electron cyclotron resonance plasma

✍ Scribed by Takashi Goto; Hiroshi Masumoto; Mineo Niizuma


Book ID
114193068
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
231 KB
Volume
75
Category
Article
ISSN
0254-0584

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Low temperature Electron Cyclotron Reson
✍ P.L. Pernas; E. RuΓ­z; M.J. HernΓ‘ndez; J. Garrido; B.J. GarcΓ­a; J.L. Castan˜o; J. πŸ“‚ Article πŸ“… 2000 πŸ› Elsevier Science 🌐 English βš– 512 KB

Electron Cyclotron Resonance (ECR) plasma deposition process implies low temperatures at high deposition rates producing uniform and mechanically stable thin films. For these reasons ECR became an attractive tool for integrated optics technology. In this work we have combined ECR with other techniqu