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Low-temperature heteroepitaxial growth of SiGe on Si with low-pressure chemical vapor deposition

✍ Scribed by K. Nakai; M. Ozeki; K. Nakajima

Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 731 KB
Volume: 126
Category: Article
ISSN: 0022-0248
DOI: 10.1016/0022-0248(93)90035-u

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