✦ LIBER ✦
Si/SiGe/Si heterostructure growth without interface roughness at high germanium mole fractions by low temperature low pressure chemical vapour deposition
✍ Scribed by R. Schütz; J. Murota; T. Maeda; R. Kircher; K. Yokoo; S. Ono; H.L. Hartnagel
- Publisher
- Elsevier Science
- Year
- 1992
- Tongue
- English
- Weight
- 568 KB
- Volume
- 222
- Category
- Article
- ISSN
- 0040-6090
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