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Low-Temperature Growth of p-Type ZnO Thin Films via Plasma-Assisted MOCVD

โœ Scribed by Y.-F. Lu; Z.-Z. Ye; Y.-J. Zeng; H.-P. He; L.-P. Zhu; B.-H. Zhao

Publisher
John Wiley and Sons
Year
2007
Tongue
English
Weight
185 KB
Volume
13
Category
Article
ISSN
0948-1907

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Niobium nitride (NbN) thin films are of considerable interest due to their excellent mechanical and chemical stability, as well as having useful superconducting properties. Regarding the latter, NbN has a relatively high critical temperature (T c ), critical field (H c2 ), and critical current densi