Low temperature formation of SiO2 thin films by nitric acid oxidation of Si (NAOS) and application to thin film transistor (TFT)

✍ Scribed by T. Matsumoto; Asuha; W.-B. Kim; M. Yamada; S. Imai; S. Terakawa; H. Kobayashi

• Book ID: 104052333
• Publisher: Elsevier Science
• Year: 2009
• Tongue: English
• Weight: 213 KB
• Volume: 86
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2009.03.080