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Low-temperature deposition of zirconium and hafnium boride films by thermal decomposition of the metal borohydrides (M[BH4]4)

✍ Scribed by Wayda, A. L.; Schneemeyer, L. F.; Opila, R. L.


Book ID
120511997
Publisher
American Institute of Physics
Year
1988
Tongue
English
Weight
672 KB
Volume
53
Category
Article
ISSN
0003-6951

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Low-Temperature Deposition of Zirconium
✍ K. Kukli; M. Ritala; M. LeskelΓ€ πŸ“‚ Article πŸ“… 2000 πŸ› John Wiley and Sons 🌐 English βš– 429 KB πŸ‘ 1 views

Zirconium oxide thin films were grown by atomic layer deposition (ALD) at low temperatures, ranging from 150 C to 300 C, by alternate surface reactions between Zr[OC(CH 3 ) 3 ] 4 and H 2 O. The films grown in the temperature range 200Β± 300 C were nanocrystalline. No films could be deposited above 30