Low-Temperature Deposition of Zirconium
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K. Kukli; M. Ritala; M. LeskelΓ€
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Article
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2000
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John Wiley and Sons
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English
β 429 KB
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Zirconium oxide thin films were grown by atomic layer deposition (ALD) at low temperatures, ranging from 150 C to 300 C, by alternate surface reactions between Zr[OC(CH 3 ) 3 ] 4 and H 2 O. The films grown in the temperature range 200Β± 300 C were nanocrystalline. No films could be deposited above 30