Low Temperature Chemical Vapor Deposition of Aluminosilicate Thin Films on Carbon Fibers
โ Scribed by Vernal N. Richards; Jason K. Vohs; Bradley D. Fahlman; Geoffrey L. Williams
- Book ID
- 109256182
- Publisher
- John Wiley and Sons
- Year
- 2005
- Tongue
- English
- Weight
- 798 KB
- Volume
- 88
- Category
- Article
- ISSN
- 0002-7820
No coin nor oath required. For personal study only.
๐ SIMILAR VOLUMES
The relations between chemical vapor deposition (CVD) parameters and the resultant pyrolytic carbon microstructures have been examined for matrix deposition in fibrous carbon substrates. The parameters considered are temperature (1200-145O"C), pressure (20-630 Torr), C/H ratio (l/4-1/14), total flow
Low-temperature growth of YBa2Cu30 x films by CVD has been investigated using Y(DPM) 3, Ba(DPM)? and Cu(DPM) o as starting materials and N20 as an oxidizing agent. 123-perovskite structure ha~ been prepared at a substrate temperature of 530 C, Superconducting films with zero-resistivity T\_ of 15K