## The dlffhston kmettcs of the alumlnum-slhcon system at low temperatures has been charactertzed by a novel techmque Thl~ techmque employs samples ~onststmg of alternating layers of aluminum and 9thcon and permtts the chatactertzatton of the dtffuston kmettcs at the AI-St rater]ace through the cumu
✦ LIBER ✦
Low temperature characterization of AlSi diffusion kinetics
✍ Scribed by M. Patrick Dugan; Thomas Tsakalakos
- Publisher
- Elsevier Science
- Year
- 1988
- Tongue
- English
- Weight
- 439 KB
- Volume
- 4
- Category
- Article
- ISSN
- 0749-6036
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