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Low temperature adsorption and reaction of NO on GaAs(110)

โœ Scribed by Klaus Kern; Yves Chabal; Gregg Higashi; Andreas Vom Felde; Mark Cardillo


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
432 KB
Volume
168
Category
Article
ISSN
0009-2614

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โœฆ Synopsis


We have used polarized surface infrared spectroscopy in the multiple internal reflection mode to study the chemistry of NO adsorption on GaAs( 110 ) at 90 K. NO is found to bc reactive on the surface at these low temperatures, adsorbing dissociatively and molecularly. The reaction products identified arc molecular NzO, oxygen end bonded with the molecular axis perpendicular to the surface, and a flat-lying hyponitrito species. Heating the surface above 200 K leaves an arsenic nitride on the surface.


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