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Low-resistivity TiSi2 contacts on nitrogen implanted ultra-shallow junctions

✍ Scribed by S.L. Cheng; L.J. Chen; B.Y. Tsui

Book ID: 114194268
Publisher: Elsevier Science
Year: 1997
Tongue: English
Weight: 389 KB
Volume: 50
Category: Article
ISSN: 0254-0584
DOI: 10.1016/s0254-0584(97)80255-6

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