Rapid thermal processing for simultaneous annealing of shallow implanted junctions and formation of their TiSi2 contacts

✍ Scribed by K. Maex; R.F. De Keersmaecker

• Publisher: Elsevier Science
• Year: 1985
• Weight: 468 KB
• Volume: 129
• Category: Article
• ISSN: 0378-4363
• DOI: 10.1016/0378-4363(85)90567-4