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Low-pressure sputtering of high-TcNb3Ge

โœ Scribed by L. Kammerdiner; C. T. Wu; H. L. Luo

Book ID
104869372
Publisher
Springer US
Year
1976
Tongue
English
Weight
232 KB
Volume
24
Category
Article
ISSN
0022-2291

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The paper gives a short survey of the present state of art in low-pressure sputtering and self-sputtering. It shows main advantages of low pressure sputtering, particularly new physical conditions, i.e. (i) collisionless sight-of-line deposition process ; (ii) assistance of fast neutrals in the film