Low-pressure chemical vapor deposition of copper: Dependence of the selectivity on the water vapor added to a hydrogen or helium carrier gas

✍ Scribed by Lecohier, B.; Calpini, B.; Philippoz, J.-M.; van den Bergh, H.

• Book ID: 120602286
• Publisher: American Institute of Physics
• Year: 1992
• Tongue: English
• Weight: 894 KB
• Volume: 72
• Category: Article
• ISSN: 0021-8979
• DOI: 10.1063/1.351630