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Low-power rf plasma sources for technological applications: I. Plasma sources without a magnetic field

✍ Scribed by K. V. Vavilin; A. A. Rukhadze; M. Kh. Ri; V. Yu. Plaksin

Book ID: 110138959
Publisher: Springer
Year: 2004
Tongue: English
Weight: 97 KB
Volume: 49
Category: Article
ISSN: 1063-7842
DOI: 10.1134/1.1758329

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