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Low-energy electron attachment to SF[sub 6]. II. Temperature and pressure dependences of dissociative attachment

✍ Scribed by Troe, Jürgen; Miller, Thomas M.; Viggiano, Albert A.

Book ID
118749723
Publisher
American Institute of Physics
Year
2007
Tongue
English
Weight
861 KB
Volume
127
Category
Article
ISSN
0021-9606

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✍ Michael S. Foster; J.L. Beauchamp 📂 Article 📅 1975 🏛 Elsevier Science 🌐 English ⚖ 509 KB

EkCt~on attachment to SF6 hss been Stidicd at low prcs;urc in the 8s phk by ion cyclotron resomnce (ICR) spec-'tioscopy. Formation of stable SF; tinder cbllision-free conditions is rationdzed on the basis of radiative relaxaticn by (SF;!\*. The utility of ICR for inve$gatin~ electron attaclment at e