of Ti to a few percent. Pre-evaporation of a 300 ,~ thick CaF.~ parting layer allowed membrane removal by water-assisted peeling. Pressure testing showed membranes to have bulk tensile strength of 4.6-6.2,'< l09 dyn/cm 2 (68-92 kpsi) and to behave elastically. They could be mounted under high tensio
โฆ LIBER โฆ
Low-energy double ion-beam deposition of compound films
โ Scribed by Yoshikazu Yoshida; Teruhito Ohnishi; Yuichi Hirofuji; Hiroshi Iwasaki; Tanejiro Ikeda
- Book ID
- 113279784
- Publisher
- Elsevier Science
- Year
- 1989
- Tongue
- English
- Weight
- 315 KB
- Volume
- 37-38
- Category
- Article
- ISSN
- 0168-583X
No coin nor oath required. For personal study only.
๐ SIMILAR VOLUMES
3108. Thin-film deposition using low-ene
๐
Article
๐
1977
๐
Elsevier Science
๐
English
โ 133 KB
3109. Thin-film deposition using low-ene
๐
Article
๐
1977
๐
Elsevier Science
๐
English
โ 133 KB
of Ti to a few percent. Pre-evaporation of a 300 ,~ thick CaF.~ parting layer allowed membrane removal by water-assisted peeling. Pressure testing showed membranes to have bulk tensile strength of 4.6-6.2,'< l09 dyn/cm 2 (68-92 kpsi) and to behave elastically. They could be mounted under high tensio
3123. Thin-film deposition using low-ene
๐
Article
๐
1977
๐
Elsevier Science
๐
English
โ 139 KB
3124. Thin-film deposition using low-ene
๐
Article
๐
1977
๐
Elsevier Science
๐
English
โ 139 KB
Concentration profiles during films depo
โ
V. I. Kiprich; G. V. Kornich; A. I. Bazhin
๐
Article
๐
2007
๐
Springer
๐
English
โ 326 KB
Low energy ion beam assisted deposition
โ
J.-H Huang; C.-H Lin; C.-H Ma; Haydn Chen
๐
Article
๐
2000
๐
Elsevier Science
๐
English
โ 322 KB