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3108. Thin-film deposition using low-energy ion beams (2) Pb+ ion-beam deposition and analysis of deposits

Publisher
Elsevier Science
Year
1977
Tongue
English
Weight
133 KB
Volume
27
Category
Article
ISSN
0042-207X

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โœฆ Synopsis

of Ti to a few percent. Pre-evaporation of a 300 ,~ thick CaF.~ parting layer allowed membrane removal by water-assisted peeling. Pressure testing showed membranes to have bulk tensile strength of 4.6-6.2,'< l09 dyn/cm 2 (68-92 kpsi) and to behave elastically. They could be mounted under high tension by heating while clamped to a high thermal expansion coefficient Nylon flange.

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๐Ÿ“‚ Article ๐Ÿ“… 1977 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 133 KB

of Ti to a few percent. Pre-evaporation of a 300 ,~ thick CaF.~ parting layer allowed membrane removal by water-assisted peeling. Pressure testing showed membranes to have bulk tensile strength of 4.6-6.2,'< l09 dyn/cm 2 (68-92 kpsi) and to behave elastically. They could be mounted under high tensio

Production of Thin Epitaxial Films Using
Production of Thin Epitaxial Films Using Ion Beam Deposition
โœ Gorris, F. ;Krug, C. ;Kubsky, S. ;Baumvol, I. J. R. ;Schulte, W. H. ;Rolfs, C. ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 188 KB ๐Ÿ‘ 2 views

An ion beam deposition system to produce isotopically pure epitaxial thin films of different materials has been designed and built. Using negative ions, problems due to mass interference with molecular ions could be significantly reduced, thus allowing the production, for instance, of 29 Si films of