✦ LIBER ✦

Formation of Thin Au Films Using Negative-Ion-Beam Deposition

✍ Scribed by Heck, C. ;Chayahara, A. ;Tsubouchi, N. ;Horino, Y. ;Fujii, K. ;Iwami, M. ;Abiko, K.

Publisher: John Wiley and Sons
Year: 1997
Tongue: English
Weight: 299 KB
Volume: 160
Category: Article
ISSN: 0031-8965
DOI: 10.1002/1521-396x(199704)160:2<591::aid-pssa591>3.0.co;2-k

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Production of Thin Epitaxial Films Using

Production of Thin Epitaxial Films Using Ion Beam Deposition

✍ Gorris, F. ;Krug, C. ;Kubsky, S. ;Baumvol, I. J. R. ;Schulte, W. H. ;Rolfs, C. 📂 Article 📅 1999 🏛 John Wiley and Sons 🌐 English ⚖ 188 KB 👁 1 views

An ion beam deposition system to produce isotopically pure epitaxial thin films of different materials has been designed and built. Using negative ions, problems due to mass interference with molecular ions could be significantly reduced, thus allowing the production, for instance, of 29 Si films of

Ion Beam Mixing of Au/In Bilayer Thin Fi

Ion Beam Mixing of Au/In Bilayer Thin Film: Growth of Intermixed Layer

✍ Al-Saleh, K. A. ;Saleh, N. S. 📂 Article 📅 1997 🏛 John Wiley and Sons 🌐 English ⚖ 193 KB 👁 2 views

Effect of Ion Beam Mixing and Compound F

Effect of Ion Beam Mixing and Compound Formation on Sputter Depth Profile of a Ta/Si Multilayer Thin Film

✍ Stepanova, M. G. 📂 Article 📅 1996 🏛 John Wiley and Sons 🌐 English ⚖ 323 KB 👁 2 views

In Situ Deposition of Highly C-axis Orie

In Situ Deposition of Highly C-axis Oriented Lanthanum Modified Lead Titanate Thin Films by Multi-Ion-Beam Reactive Co-sputtering Technique

✍ J. Zhu; D. Xiao; J. Zhu; J. Zen 📂 Article 📅 1999 🏛 John Wiley and Sons 🌐 English ⚖ 76 KB 👁 1 views

Study of the electromigration behaviour

Study of the electromigration behaviour of Au-Ag thin films deposited on SiO2 substrate using AES, XPS and AFM techniques

✍ Cao, Lili; Shi, Fangxiao; Song, Weijie; Zhu, Yongfa 📂 Article 📅 1999 🏛 John Wiley and Sons 🌐 English ⚖ 409 KB 👁 2 views

The purpose of this work was to study surface diffusion of atoms in Au-Ag films deposited on SiO 2 substrate under the action of a d.c. field, focusing on the effect of chemical reaction at the Au-Ag/SiO 2 interface on the electromigration behaviour. Atomic force microscopy measurement depicted the