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Long range migration of niobium during the anodic oxidation of tantalum on niobium and aluminum on niobium duplex layers

โœ Scribed by S. Rigo; J. Siejka


Publisher
Elsevier Science
Year
1974
Tongue
English
Weight
500 KB
Volume
15
Category
Article
ISSN
0038-1098

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๐Ÿ“œ SIMILAR VOLUMES


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It has been shown previously that the kinetics of anodic film growth on Ta, Nb and Zr often depend strongly on the nature of the electrolyte. This work is an attempt to resolve this anomaly and the inconsistencies in the reported structures of the oxide layers. Electron diffraction showed the anodic

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## Abstract There are presented the results of the investigation of tantalumโ€ and niobiumโ€based metalโ€oxide bilayers degration in dependence on chemical composition of base metal. Nitrogen dissolved in metal increases stability of chemical composition and electrical properties of oxide films grown