The rate of nucleation of the anodic oxide film on bismuth in 0.1 M NaOH is limited hy electrochemical reaction at the uncovered metal surface or surface diffusion to the periphery of a spreading oxide patch, not by incorporation into the growing lattice. Anodic oxide layers grown on bismuth consist
Localised anodic oxide diffusion sources and geometry control of anodic oxide growth on silicon
β Scribed by P.F. Schmidt; J. Oroshnik; C.C. Hardman
- Publisher
- Elsevier Science
- Year
- 1964
- Tongue
- English
- Weight
- 189 KB
- Volume
- 7
- Category
- Article
- ISSN
- 0038-1101
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π SIMILAR VOLUMES
The early stages in the formation of a continuous anodic layer of bismuth oxide on a solid bismuth electrode, in the pH range 5-14, were studied. The oxide covered the surface by the simultaneous thickening and spreading of patches. The metal surface was classified into two different areas with diff
Anodic charging curves have been measured on Ti in Na,SO,, NaCl, NaNO,, NaH,P04, NasH PO&, Na,PO\* and NaOH solutions in the cd range 5-35 pAlcme. Formation rates are calculated in the region below Oa evolution. The results indicate the high-field approximation, with linearity between the reciproc