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Local Defectivity Control of 2D Self-Assembled Block Copolymer Patterns

✍ Scribed by R. Ruiz; N. Ruiz; Y. Zhang; R. L. Sandstrom; C. T. Black

Publisher
John Wiley and Sons
Year
2007
Tongue
English
Weight
559 KB
Volume
19
Category
Article
ISSN
0935-9648

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## Abstract P2VN‐__b__‐PAA is a novel diblock copolymer which has potential as a self‐assembled nanoscale patterning material. Thin spin cast P2VN‐__b__‐PAA films rapidly reorganize to vertical lamellar with exposure to acetone vapor. P2VN‐__b__‐PAA lamellar morphology was aligned by electric field