Poly(2-vinylnaphthalene)-block-poly(acrylic acid) Block Copolymer: Self-Assembled Pattern Formation, Alignment, and Transfer into Silicon via Plasma Etching
✍ Scribed by Xin Zhang; Christopher J. Metting; Robert M. Briber; Florian Weilnboeck; Sang Hak Shin; Benjamin G. Jones; Gottlieb S. Oehrlein
- Publisher
- John Wiley and Sons
- Year
- 2011
- Tongue
- English
- Weight
- 639 KB
- Volume
- 212
- Category
- Article
- ISSN
- 1022-1352
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✦ Synopsis
Abstract
P2VN‐b‐PAA is a novel diblock copolymer which has potential as a self‐assembled nanoscale patterning material. Thin spin cast P2VN‐b‐PAA films rapidly reorganize to vertical lamellar with exposure to acetone vapor. P2VN‐b‐PAA lamellar morphology was aligned by electric field under acetone vapor at a significantly faster rate and at lower electric field strengths than other polymer systems. Observed dry etching selectivity for P2VN to PAA were comparatively high for a variety of etch gases, consistent with estimations from Ohnishi and ring parameters. Block copolymer self assembled patterns were transferred to silicon via two‐step CF~4~ and SF~6~ etching. magnified image