A plasma-polymerized tetravinylsilane film of about 1 ΞΌm thickness was prepared under steady-state deposition conditions on polished silicon wafer using plasma-enhanced chemical vapor deposition. Nearsurface mechanical properties such as the reduced modulus and hardness of the plasma polymer film we
β¦ LIBER β¦
LiCoPO4 mechanical properties evaluated by nanoindentation
β Scribed by Wolfenstine, J.; Allen, J.L.; Jow, T.R.; Thompson, T.; Sakamoto, J.; Jo, H.; Choe, H.
- Book ID
- 122260353
- Publisher
- Elsevier Science
- Year
- 2014
- Tongue
- English
- Weight
- 714 KB
- Volume
- 40
- Category
- Article
- ISSN
- 0272-8842
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