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Laser plasma shockwave cleaning of SiO2 particles on gold film

✍ Scribed by Yayun Ye; Xiaodong Yuan; Xia Xiang; Wei Dai; Meng Chen; Xinxiang Miao; Haibing Lv; Haijun Wang; Wanguo Zheng


Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
944 KB
Volume
49
Category
Article
ISSN
0143-8166

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## Abstract By using remote plasma atomic layer deposition (ALD), ruthenium thin films were deposited on SiO~2~ using bis(ethylcyclopentadienyl)ruthenium [Ru(EtCp)~2~] as a Ru precursor and an ammonia plasma as a reactant. Different plasma treatments were applied, and the best results were obtained