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Laser etching of silicon by chlorine: effect of post-desorption collisions and chlorine in-diffusion on the laser desorption yield

✍ Scribed by A. Aliouchouche; J. Boulmer; B. Bourguignon; J.-P. Budin; D. Débarre; A. Desmur

Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
635 KB
Volume
69
Category
Article
ISSN
0169-4332

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