Large area excimer laser induced deposition of titanium from titanium tetrachloride

✍ Scribed by C. Lavoie; M. Meunier; R. Izquierdo; S. Boivin; P. Desjardins

• Book ID: 104738400
• Publisher: Springer
• Year: 1991
• Tongue: English
• Weight: 610 KB
• Volume: 53
• Category: Article
• ISSN: 1432-0630
• DOI: 10.1007/bf00357198

✦ Synopsis

Large area excimer laser induced deposition of titanium on fused silica from TIC14 is studied with an emphasis on process modeling. We show that several TIC14 monolayers can be adsorbed if the surface is adequately prepared and that the Ti thin film growth occurs through the photodecomposition of this adsorbed TIC14 layer. We propose two growth regimes. During an initiation phase, up to 3 nm in thickness, the adsorbed layer is photochemically decomposed giving a growth rate of ~ 0.015nm/pulse. In a second phase, the deposition rate increases to between 2 and 7 nm/pulse due to the laser heating of the preceding photochemically deposited titanium film. Between consecutive pulses, TIC14 molecules primarily from the adsorbed layer diffuse to the reaction zone leading to a new adsorbed layer ready to be transformed to solid titanium.