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Kinetics of the gas-phase reaction between iodine and trifluorosilane and the bond dissociation energy D(F3SiH)

✍ Scribed by Alan M. Doncaster; Robin Walsh

Publisher: John Wiley and Sons
Year: 1978
Tongue: English
Weight: 480 KB
Volume: 10
Category: Article
ISSN: 0538-8066
DOI: 10.1002/kin.550100108

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✦ Synopsis

The title reaction has been investigated in the temperature range 667-715K. The only reaction products were trifluorosilyl iodide and hydrogen iodide. The rate law

was obeyed over a wide range of iodine and trifluorosilane pressures. This expression is consistent with an iodine atom abstraction mechanism and for the step 1 E + F@iH -F3Si-+ HI log kl(dm3/mol.sec) = (11.54 f 0.17) -(130.5 f 2.2 kJ/mol)/RT In 10 has been deduced. From this the bond dissociation energy D(F3Si-H) = (419 f 5) kJ/mol(lOO.l kcdmol) is obtained. The kinetic and thermochemical implications of this value are discussed.

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