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Kinetics of scanned electron beam annealing of high-energy as ion implanted silicon

✍ Scribed by Krimmel, E. F. ;Oppolzer, H. ;Runge, H. ;Wondrak, W.

Publisher: John Wiley and Sons
Year: 1981
Tongue: English
Weight: 875 KB
Volume: 66
Category: Article
ISSN: 0031-8965
DOI: 10.1002/pssa.2210660219

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