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Kinetic Model for Positive Tone Resist Dissolution and Roughening

✍ Scribed by Houle, F. A.; Hinsberg, W. D.; Sanchez, M. I.

Book ID
127334855
Publisher
American Chemical Society
Year
2002
Tongue
English
Weight
299 KB
Volume
35
Category
Article
ISSN
0024-9297

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## Abstract A novel positive‐tone molecular resist possessing oxabenzonorbornadiene moiety was developed for electron‐beam (EB) lithography. The synthesized resist material showed relatively high glass transition temperature and readily formed uniform amorphous films on a silicon wafer. The sensiti