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[Japan Soc. Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (11-13 July 2000)] Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) - Remote-plasma-enhanced etching of silicon using trifluoro-acetyl-fluoride gas

✍ Scribed by Saito, Y.; Yamazaki, H.; Mouri, I.

Book ID: 126674391
Publisher: Japan Soc. Appl. Phys
Year: 2000
Weight: 167 KB
Category: Article
ISBN-13: 9784891140045
DOI: 10.1109/IMNC.2000.872710

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