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[Japan Soc. Appl. Phys 1995 Symposium on VLSI Technology. Digest of Technical Papers - Kyoto, Japan (6-8 June 1995)] 1995 Symposium on VLSI Technology. Digest of Technical Papers - A PELOX isolated sub-0.5 micron thin-film SOI technology

✍ Scribed by Gilbert, P.V.; Sun, S.-W.

Book ID: 126597757
Publisher: Japan Soc. Appl. Phys
Year: 1995
Weight: 257 KB
Category: Article
ISBN-13: 9780780326026
DOI: 10.1109/VLSIT.1995.520848

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