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ITO films prepared by facing target sputtering system

โœ Scribed by Kikuo Tominaga; Tetsuya Ueda; Takahiro Ao; Masahiro Kataoka; Ichiro Mori


Book ID
113205296
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
521 KB
Volume
281-282
Category
Article
ISSN
0040-6090

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Preparation of aluminum thin films by th
โœ Toyoaki Hirata; Masao Nagakubo; Masahiko Naoe ๐Ÿ“‚ Article ๐Ÿ“… 1991 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 383 KB

The facing targets sputtering (FTS) system, typical of plasma-free sputtering systems, was used to deposit aluminum thin films composed of very fine grains with a smooth surface, large hardness and low resistivity. When the argon gas pressure PAr was as low as 10-' Pa, the aluminum films deposited a