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Ion migration effects in r.f. “sputter cleaning” of dielectric films

✍ Scribed by Daniel V. McCaughan; R.A. Kushner


Publisher
Elsevier Science
Year
1974
Tongue
English
Weight
261 KB
Volume
22
Category
Article
ISSN
0040-6090

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Thin films of CN x were deposited by reactive r.f.-magnetron sputtering on Si(100) substrates. The effect of annealing temperatures on the structural properties of the films has been studied by Fourier transform infrared (FTIR) spectroscopy, x-ray photoelectron spectroscopy (XPS) and transmission el