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Ion-implanted capacitively coupled silicon strip detectors with integrated polysilicon bias resistors processed on a 100 mm wafer

✍ Scribed by Iiro Hietanen; Jukka Lindgren; Risto Orava; Tuure Tuuva; Martti Voutilainen; Richard Brenner; Mikael Andersson; Kari Leinonen; Hannu Ronkainen

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 604 KB
Volume: 310
Category: Article
ISSN: 0168-9002
DOI: 10.1016/0168-9002(91)91115-c

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