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Ion energy distributions in SiCl4 and Ar/O2 dry etching discharges

✍ Scribed by DAO Hope; GJ Monnington; SS Gill; N Borsing; JA Smith; JA Rees

Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 345 KB
Volume: 44
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(93)90163-5

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