O+, O2+, O3+ and O4+ ions in ArO2 sputtering discharges: comments on “Oxidation mechanism in rf CO2 plasma”, Vacuum, 36, 85 (1986)

✍ Scribed by Carolyn Rubin Aita; Michel E Marhic

• Publisher: Elsevier Science
• Year: 1988
• Tongue: English
• Weight: 122 KB
• Volume: 38
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(88)90255-2