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O+, O+2, O+3 and O+4 ions in Ar-O2 sputtering discharges : comments on “Oxidation mechanism in rf CO2 plasma”, Vacuum, 36, 85 (1986): Carolyn Rubin Aita and Michel E Marhic, Vacuum, 38, 1988, 37–38


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
141 KB
Volume
39
Category
Article
ISSN
0042-207X

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