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Ion dose dependence of the sputtering yield of Ru(0001) at very low fluences

✍ Scribed by Burnett, J. W.; Pellin, M. J.; Calaway, W. F.; Gruen, D. M.; Yates, J. T.


Book ID
124071240
Publisher
The American Physical Society
Year
1989
Tongue
English
Weight
155 KB
Volume
63
Category
Article
ISSN
0031-9007

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The polymer sputter rate dependence on ion fluence and ion chemistry (Ar, N 2 , O 2 ) at 1 keV energy was investigated using a quartz crystal microbalance (QCM) which allowed to do real time etch rate measurements and to study kinetics of sputtering. The obtained sputter rates differed drastically f