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Ion beams as analytical tools in the thermal growth of ultrathin silicon oxide films

✍ Scribed by E.B.O. da Rosa; S. Gonçalves; R.M.C. de Almeida; I.J.R. Baumvol; F.C. Stedile


Book ID
114164479
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
114 KB
Volume
175-177
Category
Article
ISSN
0168-583X

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