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A molecular dynamics simulation of ultrathin oxide films on silicon: Growth by thermal O atoms and sputtering by 100 eV Ar+ ions

✍ Scribed by Kubota, A.; Economou, D.J.


Book ID
111901919
Publisher
IEEE
Year
1999
Tongue
English
Weight
450 KB
Volume
27
Category
Article
ISSN
0093-3813

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